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The "pain" of China's semiconductor industry: photoresist is always subject to people

 The key to the development of photoresist is that its composition is complex and the process technology is difficult to master. The main components of photoresist are polymer resin, color paste, monomer, photoinitiator, solvent and additives. The technical problems involved in the development of the photoresist are numerous. It needs to be determined and optimized from the structure design and screening of oligomers, and the optimization and activity of the synthesis process. Monomer screening and control, color paste fineness control and stabilization, product formulation design and optimization, product production process optimization and stability, end-use condition matching and latitude adjustment are adjusted. Therefore, it is very difficult to develop and produce independently.  

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