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Products->Semiconductor Materials
ARC materials

Anti-reflective coating is used in the field of microelectronic lithography, the introduction of the use of photoresist process can significantly reduce the photoresist surface of the incident light reflection and scattering, thereby improving the photoresist resolution performance, according to the use time before or behind photoresist,it can be divided into bottom anti-reflective coating and the top anti-reflective coating, anti-reflective coating is an organic polymer material.

Pesan Chemical can provide customers with a variety of available organic monomer.if you take interests in our products,please don't hesitate to contact us.
 

PAG&PAC

The photoacid generator is a class of chemicals with a special structure, and its main kinds are diazonium salts, onium salts, sulfonates and organic polyhalogen compounds, which can be produced by light or heat as a further reaction catalyst, it is one of the key components of chemically amplified sensitized (sensitive) materials. The photoacid generator can be widely used in CTPglue, chemically amplified photoresist, photocurable coating, etc.

Pesan Chemical is mainly concerning with sulfonates and organic halogen-based acid generator and provide raw materials for customers.if you take interests in our products,please don't hesitate to contact us.
 

PR monomers

PR is a material to form image pattern using the changed solubility in a developer by being exposed to light or radiation. It is a liquid type composed of high matrix molecule, sensitizer, additive, and solvent.

Pesan Chemical can provide a variety of photoresist monomer for LC display and IC.if you take interests in our products,please don't hesitate to contact us.



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